• Maximum Dˉ current > 3 mA DC in 20 – 30 keV energy range
• Long intervals between maintenance (1 year)– no filaments to replace
• RF powered - no metal sputtering due to filaments (important for ion implantation)
• Ability to pulse beam
• Extensive beam instrumentation options
• Uses TRIUMF-licenced¹ and University of Jyväskylä licenced technology
  

1. Technology licensed from TRIUMF for world-wide distribution.

The RF.D-3.30-SYS Filament Ion Source system includes the following:
Ion source & vacuum box

• Vacuum system & gauges
• Power supplies
• High voltage grounding & bleeder circuits
• RF amplifier & impedance matching systems
• PLC controls & software
• User interface & Ethernet-based remote controls
• Mass flow controller for feed gasses Customizable with the following subsystems:
• Ion source stand and RF stand
• High-voltage Faraday cage / enclosure
• Low voltage and high voltage racks
• 40 kV isolation transformer
• Personnel access control interlocks
• Water flow gauges and interlocks
• Water de-ionization system
• Sliding Faraday cup
• Fiber optic beam profile monitor
• TRIUMF-licensed emittance scanner

A D-Pace news story about acheiving 3.5 mA DC D^- (negative deuterium) beam with this ion source can be found here.