IN DEVELOPMENT - NOT COMMERCIALLY AVAILABLE

TRIUMF & University of Jyväskylä Licensed RF Volume Cusp Ion Source System

RF Ion Sources have the following important advantges over filament-powered ion sources:

• Long intervals between maintenance (>1 year) – no filaments to replace
• No sputtered metal deposits due to filaments (important for Ion Implantation)
• Ability to pulse beam

The system inccludes the ion source, software and controls, power supplies, vacuum pumps and instrumentation, high voltage subsystems, and access control. Beamlines, slits, emittance scanners, Faraday cups, collimators, and mass spectrometers can also be incorporated. This system can be operated standalone, but the PLC also integrates with higher level control systems through Ethernet controls.

Enquire about other negative and positive ion beams, and our higher current filament-powered ion sources.

The ISV.RF-40 RF Ion Source system is a complete, turnkey ion source system including:

• Ion source & Vacuum box
• Vacuum system & gauges
• Power supplies, PLC controls & software
• User interface & Ethernet-based remote controls
• Low voltage and high voltage racks
• 40kV isolation transformer
• Interlocks and HV grounding system
• Personnel access control interlocks
• Water flow gauges and interlocks
• Mass flow controller for feed gasses
• Optional high-voltage Faraday cage
• Optional water de-ionization system
• Optional sliding Faraday cup
• Optional fiber optic beam profile monitor
• Optional TRIUMF-licensed  emittance scanner
• Optional 1:500 mass spectrometer with slits

Emittance Data

1. Technology licensed from TRIUMF for world-wide distribution.